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Inline Wet Process Equipment for Cleaning and PSG/BSG Removal

HAN'S-PSG13000A/HAN'S-BSG13000A

Inline Wet Process Equipment for Cleaning and PSG/BSG Removal

Application Field:

The equipment is applicable for single-side cleaning of high-efficiency TOPCon, BC, and HJT solar cells, removing PSG/BSG.

Process Flow:

Water film → PSG removal → Water rinse → Drying (for reference only)

Water film → BSG removal → Water film → BSG removal → Water rinse → Drying (for reference only)

Product Features

  • 01
    The closed-loop motion control system ensures smooth movement of theconveyor mechanism;
  • 02
    The upper surface is protected by a water film and wet roller, providing complete protection to the front side while removing PSG/BSG from the lower surface and edges of the diffused silicon wafer;
  • 03
    The equipment can be equipped with non-metallic process equipment to improve equipment cleanliness;
  • 04
    The imported PLC controller is used to steadily increase equipment capacity:
    10,000 pcs/h - 210 silicon wafers (10 channels);
    13,000 pcs/h - 182 silicon wafers (12 channels).

Main Parameter

Item

Technical Indicators

Silicon wafer size (mm)

182/210/230 optional

Uptime

≥ 99%

Fragment rate

≤ 0.01%

External dimensions

5360/8560×3160×2500(L×W×H)

Capacity

182 ≥ 15000pcs/H (12 channels)

210 ≥ 12000pcs/H (10 channels)

Belt speed

1-5m/min adjustable

Power consumption

PSG:30KW;BSG:35KW