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HAN'S-TEX11000A-21E-L
Automatic Batch-type Monocrystalline Texturing and Cleaning Equipment
Application Field:
It is mainly used for texturing and cleaning of monocrystalline silicon wafers for solar cells.
Process Flow:
Damage removal → Pre-cleaning → Mono-texturing → Post-cleaning/O₃ cleaning → Acid cleaning → Pre-dehydration → Drying (for reference only)
Product Features
- High production capacity and low power consumption:
4cassettes/batch, 11,000 pcs/h – 210mm silicon wafers (116 pieces);
6cassettes/batch, 15,000 pcs/h – 182mm silicon wafers (120 pieces); - Wide process window and high cleanliness;
- Quick online liquid replacement;
- High automation and support for MES, RFID, and optional online weighing function.
Main Parameter
Item | Technical Specifications |
|---|---|
Wafer Size (mm) | 182/210/230 (optional) |
Uptime | ≥ 99% |
Chipping Rate | ≤ 0.01% |
Dimensions | 26140×3106×3383(L×W×H) |
| Cassette Loading Capacity | 4 cassettes/batch, 6 cassettes/batch |
Max. Lifting Weight | 100kg |
Capacity | 600 pcs/batch, 13,500 pcs/h – 210mm silicon wafers (100 pieces); 600 pcs/batch, 15,000 pcs/hour – 182mm silicon wafers (120 pieces); |
Cleaning Cycle Time | 2.4 min/carrier (user-defined, adjustable) |
Power Consumption | 245 kW + 144 kW (heater) |
