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HPAT260A
Atomic Layer Deposition
Application Field:
The independently developed and designed high-capacity tubular ALD coating machine provides ultra-thin and high-quality dielectric films such as SnOx, AlOx, NiOx, and ZnOx for the manufacturing of high-efficiency solar cells. It cooperates with automation to achieve stable and reliable operation.
Product Features
- The optimized spray plate and the chamber space improves the uniformity of the flow field, achieves ultra-large production capacity, and enhances maintainability
- The spare parts are easy to change and maintain
- Both the inner and outer chambers are equipped with sealing rings to prevent situations where the inner chambers cannot be tightly sealed
- Pull-out partitioned heating plate design for easy maintenance
- Optimized design of flow field space to reduce TMA loss and process time
Basic Parameters
| Item | Technical Indicators |
|---|---|
| Silicon wafer size (μm) | 182-230 |
| Film type | Al2O3、SnOx、SiOx、NiOx 、 ZnOx |
| Film thickness | 1-10nm controllable |
| Film uniformity | In wafer:≤4%, between wafer:≤4%, between batch:≤3% |
| Coating | Double-insert single-side coating |
| Uptime | ≥ 98% |
| Chipping rate (without auto loadingunloading) | ≤ 0.02% |
| Reaction chamber | Double chambers (internal and external) |
| Loading method | Horizontal chamber |
| Boat handling method | The process transfer device remains in the chamber |
| Loading capacity | 182mm: 3360 pcs/chamber, double boats |
| Ultimate vacuum | ≤ 0.08 Torr (~10 pa) |
| Process pressure | 0.5-10 Torr |
| Air tightness | ≤ 1x10-7pa.m3/s |
| TMA air supply method | N2 source-carrying/vapor |
| Pump speed specification | ≥1820m3/h+ISO160 |
| Process temperature | 150-300℃±1℃ |
| Number of warm zone | 3 |
| Cooling water | 2-4 kgf/cm2 |
| Equipment size L*W (Main body includes pump and ozone machine) | L8540*W4430*H2450 (mm) |
| N2 demand | 5N (The machine provides a 9N purifier) |
| Power supply | 3-phase 5-wire system 380V±5%, 50Hz±1Hz; |
